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Used processing

  • 2011 PECVD Double Chamber ULVAC

    2011 PECVD Double Chamber ULVAC CME-200J Plasma-Enhanced Chemical Vapor Deposition)

    • Manufacturer: Ulvac
    • Model: CME-200

    CHAMBER 1 GAS BOX CONFIG GAS 1 Aera TC FC-R7800 SiH4(10%)/N2 500SCCM GAS 2 Aera FC-7700 N2O 2000SCCM GAS 3 Aera FC-7700 O2 100SCCM GAS 4 Aera FC-7700 CF4(0.424) 500SCCM PROCESS CHAMBER 1 CONGIF 250MMX250MM ...

    Wu Xi Shi, China
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    ULVAC SRH-420MC

    • Manufacturer: Ulvac
    • Model: SRH-420MC

    Manufacturing process: film deposition | Inch: 6

    Tokyo, Japan
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    2016 ULVAC SIV-500

    • Manufacturer: Ulvac
    • Model: SIV-500

    Manufacturing process: film deposition | Inch: 6

    Tokyo, Japan
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    2014 ULVAC SIV-200

    • Manufacturer: Ulvac

    Manufacturing process: film deposition | Inch: 4

    Tokyo, Japan
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    2006 ULVAC ei-5

    • Manufacturer: Ulvac
    • Model: EI-5

    Manufacturing process: film deposition | Inch: Square Substrate

    Tokyo, Japan
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    2006 ULVAC ei-5

    • Manufacturer: Ulvac
    • Model: EI-5

    Manufacturing process: film deposition | Inch: Square Substrate

    Tokyo, Japan
  • Ulvac

    Ulvac

    • Manufacturer: Ulvac

    CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers. High-density plasma process with high-frequency (27.12 MH...

    Munich, Germany