Used Etching Systems in South Korea

2009 SUNIC, TENACIER-400VE, ICP Etcher

• Manufacturer: SUNIC

220VAC, 3Phase, 60Hz, 100A Pneumatische Lucht 5~7kgf/c㎡, Gas 1.5~2kgf/c㎡ - BESCHRIJVING: 220VAC, 3Phase, 60Hz, 100A Pneumatische Lucht 5~7kgf/c㎡, Gas 1.5~2kgf/c㎡ - CONDITION: Het werken/deïnstalleert, zoals is

2011 Tainics, TE3100, ICP Etcher

• Manufacturer: Tainics

Normale GaN-etsing, Hoge GaN-etsing, PSS-etsing - CONDITIE: Werken/De-installeren, Zoals het is

2011 Tainics, TE3100, ICP Etcher

• Manufacturer: Tainics

Normale GaN-etsing, Hoge GaN-etsing, PSS-etsing - CONDITIE: Werken/De-installeren, Zoals het is

2013 Oxford, Plasmalab100-ICP380, ICP Etcher

• Manufacturer: Oxford

N/A - CONDITIE: Zoals het is Serienr.: 94-515033 | Hoeveelheid: 1 | Uitrustingsdetail: ICP Etcher | Apparatuur: ICP Etcher | Beschrijving: N/A

2013 Oxford, Plasmalab ICP380-PLASMALAB100, ICP Etcher + PECVD

• Manufacturer: Oxford

N/A - CONDITIE: Zoals het is Serienr.: 94-515033 | Hoeveelheid: 1 | Uitrustingsdetail: ICP Etcher + PECVD | Apparatuur: ICP Etcher + PECVD | Beschrijving: N/A

2010 Top ENG, LX-380, ICP Etcher

• Manufacturer: Top Eng

N/A - CONDITIE: Werken/De-installeren, Zoals het is

SLR-770

Plasmatherm SLR-770 ICP Shuttle Lock, Etching SYSTEM Please find attached PDF format for more details.

TelPla AG200

PVA TePLA AG 200, 2INCH~6INCH, Plasma Asher S/N : 1071, 78 Net dimensions and weight : 540*600*360mm / 60Kg Please find attached PDF format for more details.

M/PLEX ICP AL

STS M/PLEX AL ETCHER Please find attache PDF format for more details.

M/PLEX ICP SI

STS M/PLEX ICP SI ETCHER, 6INCH Please find attached PDF format for more details.

NOVELLUS PEP3510

• Manufacturer: Lam Research - Novellus

Novellus GASONICS PEP3510 IRIDIA DL(S) DUAL Process : Asher, Wafer Size : 200mm SYSTEM Configuration is as attached PDF format. Missing Items as below. - YASKAWA XU-RCM 4700 : Missing. - ASTEK D13765, Q'TY : 1, L...

GASONICS GASONIC L3510

• Manufacturer: GaSonics

GASONIC L3510 Single Wafer Downstream Photoresist Asher 8” configured (can change to 6” ) Quartz Plasma Tube and Baffles ASTEX Microwave 1.2kw Temperature Controlled Wafer Cooled Aluminum Process Chamber ...

2010 AMAT CENTRIS DPS MESA

• Manufacturer: Amat
• Model: CENTRIS DPS MESA

Wafer size: 12" | Process: ETCHER | Shipping: EXW`

Unaxis VERSALINE ICP(DSE-III)

• Manufacturer: Unaxis

Plasmatherm Unaxis ICP Etcher 6inch ESC Chuck VERSALINE - Loadlock Chamber & Transfer Chamber 6inch Cassette Type - Process Chamber 6inch ESC Chuck Type - RF Generator Module. - Monitor Rack - Chiller Unit S/N ...

LAM TORUS 300K

• Manufacturer: Lam Research - Novellus
• Model: TORUS 300K