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MDXN-31D4 High precision double-sided lithography machine
MDXN-31D4 High precision double-sided lithography machine Purpose and characteristics This equipment is mainly used for the development and production of small and medium-sized integrated circuits, semiconductor ...
Guangzhou, China
SUSS MA150CC
- Manufacturer: SÜSS MicroTec
- Model: MA150
SUSS MA150CC MASK ALIGNER AS-IS MANUAL TOPSIDE ALIGNER WAFER SIZE: 150MM AVAILABLE IN WAREHOUSE
Hong Kong
KARL SUSS MA6
- Manufacturer: SÜSS MicroTec
- Model: MA6
KARL SUSS MA6 manual Topside Aligner 150mm as-is complete tool available in warehouse contact us for more detail
Hong Kong
2002 LRC 9600
- Manufacturer: LRC
TM A6 SERIAL : 8987 VINTAGE : 00/01/11 VCE LIP SEAL TYPE ROBOT MAGNATRAN 7 003-1600--27 PM-4 M/W SERIAL: STRIP - 204 PM-1 M/W SERIAL: STRIP - 203 PM-2 9600 DFM SERIAL: 96-6...
$700,000 USDSouth Korea
Spin coater without temperature
---Spin Coater The Spin Coater is a device that drips all kinds of glue on a high-speed rotating substrate and uses centrifugal force to uniformly coat the glue on the substrate. The thickness of the film depends...
Guangzhou, China
Tokyo, Japan2008 UNIHITE SYSTEM XVA-160
- Manufacturer: UNIHITE SYSTEM
Manufacturing process: examination | Inch: square base
Tokyo, Japan- Tokyo, Japan
- Tokyo, Japan
- Tokyo, Japan
- Tokyo, Japan
1995 CANON MPA600SUPER
- Manufacturer: Canon
- Model: MPA600
Manufacturing process: photolithography | Inch: 6
Tokyo, Japan- Tokyo, Japan
Mask Aligner
MOS-2A Mask Aligner Mask Size: a. 100 x 100 x 2 ~ 3 mm b. 75 x 75 x 2 ~ 3 mm c. 65 x 65 x 2 ~ 3 mm Substrate Size: 35 ~ 75 mm OD Exposure Resolution: 2 µm Mask and Substrate Move Range: X,Y≥±2.5mm; q (Rotating) ≥...
Singapore