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SensArray 1410-0-5003D RTD Process Probe KLA Tencor 1410-05003D_SA New Surplus
- Manufacturer: KLA-Tencor
SensArray 1410-0-5003D RTD Process Probe KLA Tencor 1410-05003D_SA New Surplus This SensArray 1410-0-5003D RTD Process Probe KLA Tencor 1410-05003D_SA is new surplus. This unit comes with a Report of Calibration....
$503 USDAlbuquerque, NM - Trusted Seller

KLA Flexus FLX2320
- Manufacturer: KLA-Tencor
- Model: FLX-2320
KLA-TENCOR FLX-2320 FILM STRESS MEASUREMENT SYSTEM consisting of: - Model: FLX-2320I - Manual Wafer Load - Thin Film Stress Measurement System - Chuck Size can be configured for up to 8“ wafers - Temperature...
United States 
KLA TENCOR P10
- Manufacturer: KLA-Tencor
- Model: P-10
Information: KLA TENCOR P10 KLA / TENCOR P10 Wafer Testing and Metrology Equipment is a user-friendly, automated, and flexible metrology system designed to meet the particular needs of semiconductor and ...
- Trusted Seller

KLA-Tencor Corp. Archer 500 AIM SCOL
- Manufacturer: KLA-Tencor
5 available 300mm Overlay Measurement System Metrology Equipment Archer 500 AIM main components- integrated console inspection station equipment frond end module (EFEM) Optics system HLS (halogen light s...
Europe 
LASER&PHYSICS SISCAN-2-M7325
- Manufacturer: LASER&PHYSICS
Process: Mask Test Machine | Wafer size: N/A | Shipping: EXW
South Korea
NCS RA Series Fully Automatic Test System
- Manufacturer: NCS
Instrument name: RA series fully automatic testing system | Instrument model: RA Series | Manufacturer: Steel Nano | Origin: Beijing, China | 1. stable test rate: Ensure the reliability and comparability of test...
Beijing, China
NCS electronic extensometer
- Manufacturer: NCS
Instrument name: Electronic extensometer | Manufacturer: Steel Nano | Origin: Beijing, China | Electronic extensometer is a core device used to accurately measure the linear deformation between two points of a m...
Beijing, China
NCS Fracture Image Analyzer
- Manufacturer: NCS
Introduction to the instrument: The entire device and all components are independently developed, with full independent intellectual property rights. On July 4, 2012, a state invention patent was filed, patent na...
Beijing, China
HORIBA, Ltd. PD10-EX
- Manufacturer: Horiba
Reticle / Mask Particle Detection System Complete particle detection and removal with one machine for enhanced efficiency and yield improvement in semiconductor manufacturing processes Since its launch in 1984, t...
Kyoto, Japan
1998 SOLID STATE MEASRUEMENT INC. SSM150
- Manufacturer: SOLID STATE MEASRUEMENT INC.
*. Measurement perfomance: - Resistivity and Dopant concentration - Resistance measurement & Carrier concentration profile analysis in all structures of silicon *. Measurement configuration: - Carrier concentrati...
Cheonan-si, South Korea
2006 KLA eS32
- Manufacturer: KLA-Tencor
- Model: ES32
eS32 is a top-of-the-line mask and wafer inspection equipment that is designed to meet the most stringent quality standards for semiconductor product manufacturing. This system provides comprehensive, high-resolu...
Regensburg, Germany
