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2005 HITACHI S-9380II
- Manufacturer: Hitachi
- Model: S-9380 II
Manufacturing process: examination | Inch: 12
Tokyo, Japan- Tokyo, Japan
- Tokyo, Japan
- Tokyo, Japan
- Tokyo, Japan
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Manufacturing process: examination | Inch: 12
CD-SEM (Critical Dimension Scanning Electron Microscopy) is a high‑precision inspection tool used in semiconductor metrology to measure linewidths, spaces and feature profiles on wafers and masks. It combines electron imaging with advanced software to deliver nanometer‑scale CD measurements, overlay checks and defect characterization. CD‑SEMs are common in fabs and R&D and require controlled environments, regular calibration and specialized service for repeatable, traceable results.
Review service and vacuum logs, column condition, detector history, software licenses and versions, calibration certificates, availability of spare parts and any completed upgrades or refurbishments.
Ensure appropriate cleanroom class, vibration isolation, stable power and grounding, chilled water or HVAC, compressed air/gas hookups, adequate floor loading and operator space.
Use specialized freight with column locking, climate control, shock sensors, secure crating and an experienced equipment transporter; plan for on‑site unpacking and qualification.
Regular checks include vacuum pump service, electron source replacement or conditioning, detector cleaning, stage calibration, software updates and preventive maintenance by trained technicians.
Not always; ask for recent calibration certificates or arrange manufacturer or accredited‑lab calibration and establish a periodic verification schedule for traceability.