Used Semiconductors in Bavaria, Germany

2000 Tokyo Seimitsu Co., AWD200T

• Manufacturer: Accretech - Tokyo Seimitsu - TSK

Trf_WAFER SAW_ACCRETECH AWD200T_WSTSK00162 Width: 45.669  in  (116.0 cm) | Depth: 53.150  in  (135.0 cm) | Height: 48.622  in  (123.5 cm) | Weight: 2,866  lb  (1,300 kg)

1999 BESI FICO_AMS11MR

• Manufacturer: BESI

MOLD_FICO FICO AMS-11-MR1_MP23 Width: 83.465  in  (212.0 cm) | Depth: 44.882  in  (114.0 cm) | Height: 58.661  in  (149.0 cm) | Weight: 11,023  lb  (5,000 kg)

Ulvac

• Manufacturer: Ulvac

Batch type equipment of chemical dry cleaning for remoral of native oxide in Narrow and Deep-contact patterns of advanced semiconductor. Damage-free (remote plasma and low-temperature process) High throughput and...

2006 Scrap 3x mini buffers (10011500,10011501,10011502)

These 3 mini buffers (10011500,10011501,10011502) will be scrap because 1: linked machines were already scrapped 2: function isn't complete DA linking PLC system(PLC???)

Ulvac

• Manufacturer: Ulvac

The Enviro-1Xa advanced plasma resist strip system from ULVAC is the latest photoresist removal equipment offering exceptional performance at an incredible price. Specifically designed for non-300mm fabs, it is e...

2016 Siebec GmbH P50-52527

• Manufacturer: Siebec GmbH

Detailed Configuration/Specification of the tool: Filter without pump, Polypropylen, max. 25m³/h Manual existing Originally packed, never used

2017 Hiller GmbH DP484/11012/FD HILLER DECAPRESS DP

• Manufacturer: Hiller GmbH

Ulvac

• Manufacturer: Ulvac

The SME Series (SME-200) is a series of space-saving, low-cost cluster-type sputtering systems ideal for SAW devices and compound semiconductors.The SME-series lets you create a highly cost-effective line tailore...

Ulvac

• Manufacturer: Ulvac

Dry etching system for high volume production with good cost performance and wide selection of tool configuration. GaN Recess with selectivity to AlGaN >350 precise etch stop using laser interferometry EPD low da...

2011 PVA TePla TWIN

• Manufacturer: TePla
• Model: TWIN

Implant Dose Measurement

Ramgraber SST

• Manufacturer: Ramgraber

Used Configuration: Tank 1: EKC Tank 2: P1331 Tank 3 and 4: DMF Tank 5: IPA Known errors: Filter from tank 4 is leaking Heater 1 from tank 4 is broken Heater 3 from tank 4 is broken

Ulvac

• Manufacturer: Ulvac

CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers. High-density plasma process with high-frequency (27.12 MH...

Ulvac

• Manufacturer: Ulvac

NE550H is a multipurpose high-density plasma etching system, specifically for R&D test facilities such as universities and government agencies. Equipped with low-pressure, low-electron-temperature and high-densit...

Ulvac

• Manufacturer: Ulvac

Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source. ICP type etching chamber, CCP or Ashing chamber is also selectable as 2nd chamber. Low process pressure, high den...

1995 BESI Holland MK-1

• Manufacturer: BESI Holland

machine is Functioning Power requirements: 380 V     3 Phase | Other information: Power Consumption : 6,25 kVA Temp Range : 20-28 C | Width: 56.299  in  (143.0 cm) | Height: 68.976  in  (175.2 cm) | Weight: 6,834...