New Deposition Equipment (Cvd, Pvd)

PVD Physical vapor deposition
- new
PVD Physical vapor deposition Product introduction: It is widely used in the batch production of semiconductor and LED production lines, and can meet the various process requirements for the uniform deposition of...
Guangzhou, China
PECVD Plasma enhanced chemical vapor deposition equipment
- new
PECVD Plasma enhanced chemical vapor deposition equipment Product introduction ◆ Fully automatic control of process time, temperature, gas flow, valve action and reaction chamber pressure is realized by industria...
Guangzhou, China
PECVD process of cold infrared chip
- new
PECVD process of cold infrared chip
Guangzhou, China
Inductive coupling plasma etching (icp) system
- new
Inductive coupling plasma etching (icp) system Project configuration and machine structure diagram Process result Quartz / silicon / grating etching Using BR mask to etch quartz or silicon materials, the grating ...
Guangzhou, China
MDICP-5000F Fully automatic ICP etching machine
- new
MDICP-5000F Fully automatic ICP etching machine 1．System overview ▲Executive summary The equipment is a two chamber vacuum system. One chamber is the injection sampling chamber and the other is the etching chambe...
Guangzhou, China
MDPS-560 Pyriform Double Chamber Sputtering System
- new
Used for preparing single/multi-layer functional nanofilms including various hard, metallic, semiconducting and dielectric films for universities and science institutions. Sputtering vacuum chamber, magnetron spu...
Guangzhou, China
Heterojunction plate type PECVD
- new
Heterojunction plate type PECVD
Guangzhou, China
High temperature PECVD process
- new
High temperature PECVD process
Guangzhou, China
Reactive ion etching system
- new
Reactive ion etching system Project configuration and machine structure diagram Process result Silicon-based material etching Silicon-based materials, nano-imprint patterns, array patterns and lens pattern etchin...
Guangzhou, China
LPCVD: Low Pressure Chemical Vapour Deposition System
- new
Low Pressure Chemical Vapour Deposition System Designed and manufactured to meet the high temperature and rapid cooling requirements of graphene and CNT research, Angstrom’s LPCVD (Low Pressure Chemical Vapour De...
Singapore
NEBULA SERIES: Semi/ Fully Automated Cluster
- new
LIMITS: THERE AREN’T ANY We dream with you to determine the modules that will bring your potential innovations to reality. PVD, CVD, ALD, masking and parking transfer, stages with heating/cooling, sources that as...
Singapore
Linear Sputter
- new
This series of Linear Sputter PVD systems allows for high throughput production on large substrates, can be seamlessly integrated into larger clusters of production tools, and provides impressive uniformity. Usin...
Singapore
Internal-Mount End Block – MC SeriesSpecificationsFeatures & Benefits External-Mount End Blocks
- new
Sputtering Components has a complete line of internal-mount end blocks (rotary sputtering cathodes). With few parts, they are designed to be extremely reliable and for do-it-yourself maintenance for the lowest co...
Singapore
Ulvac
- new
- Manufacturer: Ulvac
CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers. High-density plasma process with high-frequency (27.12 MH...
Munich, Germany
Ulvac
- new
- Manufacturer: Ulvac
The SME Series (SME-200) is a series of space-saving, low-cost cluster-type sputtering systems ideal for SAW devices and compound semiconductors.The SME-series lets you create a highly cost-effective line tailore...
Munich, Germany