2011 Mask Aligner SUSS MicroTec MA200E
used
- Manufacturer: SÜSS MicroTec
- Model: MA200e
- Alignment System MA200E TSA - Chuck 8" _Mask Holder for 8" Wafer -PC -Aut. Adjustment ( Cognex Patmex ) - Lamphouse unit LH 1500 - Suss DVM 8 dual video Microscope ( 2CCD – Cameras /set of rotating Objecti...
Wu Xi Shi, China2010 MASK ALIGNER Süss MicroTec MA200CC Lithography
used
- Manufacturer: Süss MicroTec
Features: Capable of wafers up to 8"/200mm Capable of working with wafer masks up to 9" x 9" Automatic mask aligner Configured for top side alignment Ergonomic Cassette plateforms 1000 watt lamp house Lamp...
Wu Xi Shi, China2010 MASK ALIGNER Süss MicroTec MA6/BA6 Lithography
used
- Manufacturer: Süss MicroTec
SUSS MA 6 / BA 6 Mask Aligner - Topside (TSA) Alignment - Backside (BSA) Alignment - Suss DVM6 Microscope - UV400 splitfield Optics (for 365nm and 405nm exposure) CIC 500 Power Supply Capable of Hard, Soft, V...
Wu Xi Shi, China2013 MASK ALIGNER Süss MicroTec MA8/BA8 GEN3 Lithography
used
- Manufacturer: Süss MicroTec
The Süss MicroTec MA8 BA8 is a standard UV lithography tool for exposing wafers through the mask. Exposure can be carried out in proximity mode or in contact mode. The MA8 is equipped with top side optical micros...
Wu Xi Shi, ChinaPCB solder mask exposure machine
new
Its reasonable design and stable performance improve the work efficiency and the quality of the products greatly. This machine is equipped LED light sources, greatly saving energy, cover different wavelengths, gr...
Beijing, ChinaMDXN-31D2 Mask aligner
new
MDXN-31D2 Mask aligner Purpose and characteristics Mainly used for the development and production of small and medium-sized integrated circuits, semiconductor components, optoelectronic devices, surface aco...
Guangzhou, ChinaMDXN-25D Mask aligner
new
MDXN-25D Mask aligner Purpose and characteristics This equipment is a precision lithography machine developed by our company specifically for the use characteristics of lithography machines in various colleges an...
Guangzhou, ChinaMDXN-43D4 High precision mask aligner
new
MDXN-43D4 High precision mask aligner Purpose and characteristics This equipment is designed according the needs of market. Can do substrate below 100*100mm. it suitable for one time exposure product. Can do like...
Guangzhou, ChinaMDXN-25D4 High precision mask aligner
new
MDXN-25D4 High precision mask aligner Purpose and characteristics This equipment is mainly used for the development and production of small and medium-sized integrated circuits, semiconductor components, and surf...
Guangzhou, ChinaMDHS-AL8 8" Fully automatic single-sided lithography machine
new
MDHS-AL8 8" Fully automatic single-sided lithography machine 1、 Technical parameters: 18. Foot cushion airbag Like recognition and automatic alignment systems, alignment workbenches, loading robots, unloading ro...
Guangzhou, ChinaMDXN-25X High precision single side lithography machine
new
MDXN-25X High precision single sided lithography machine Purpose and characteristics This equipment is a precision lithography machine developed by our company specifically for the use characteristics of lithogra...
Guangzhou, ChinaMDXN-31D4 High precision double-sided lithography machine
new
MDXN-31D4 High precision double-sided lithography machine Purpose and characteristics This equipment is mainly used for the development and production of small and medium-sized integrated circuits, semiconductor ...
Guangzhou, ChinaMCXJ-MLS8 Maskless lithography System Equipment specifications
new
MCXJ-MLS8 Maskless lithography System Sample: Equipment structure diagram Exposure host structure diagram Equipment specifications
Guangzhou, ChinaMDLB-ASD2C2D automatic coating and developing machine
new
MDLB-ASD2C2D automatic coating and developing machine The equipment adopts a stainless steel frame, and the inner and outer sheet metal are stainless steel mirror panels. The bottom of the equipment is equipped w...
Guangzhou, ChinaSpin coater without temperature
new
---Spin Coater The Spin Coater is a device that drips all kinds of glue on a high-speed rotating substrate and uses centrifugal force to uniformly coat the glue on the substrate. The thickness of the film depends...
Guangzhou, ChinaSÜSS MicroTec MA200e Mask Aligner
used
- Manufacturer: SÜSS MicroTec
- Model: MA200e
Good condition SÜSS MicroTec MA200e Mask Aligners manufactured in 2005. Located in USA and other countries. Click request price for more information.
USA