CVD system Concept-150/200
- Manufacturer: Lam Research - Novellus
This device supports 4/5/6 and 8 inch wafers and forms silicon oxide and silicon nitride films on wafers by plasma CVD. The basic configuration consists of three modules: a process module, an RF generator module ...
Tokyo, Japan
2003 ANELVA C-7730FH
- Manufacturer: Anelva
- Model: C-7730FH
Manufacturing process: film deposition | Inch: 4
Tokyo, Japan- Tokyo, Japan
2006 ULVAC ei-5
- Manufacturer: Ulvac
- Model: EI-5
Manufacturing process: film deposition | Inch: Square Substrate
Tokyo, Japan2006 ULVAC ei-5
- Manufacturer: Ulvac
- Model: EI-5
Manufacturing process: film deposition | Inch: Square Substrate
Tokyo, Japan- Tokyo, Japan
2016 ULVAC SIV-500
- Manufacturer: Ulvac
- Model: SIV-500
Manufacturing process: film deposition | Inch: 6
Tokyo, Japan- Tokyo, Japan
- Tokyo, Japan
2010 SAMCO PD-3800L
- Manufacturer: Samco
- Model: PD-3800L
Manufacturing process: film deposition | Inch: 3
Tokyo, JapanWATKINS JOHNSON WJ-999R
- Manufacturer: Watkins-Johnson
- Model: WJ-999R
Manufacturing process: film deposition | Inch: 6
Tokyo, JapanWATKINS JOHNSON WJ900, 1000 Series
- Manufacturer: Watkins-Johnson
This equipment is, 4/5/6 and 8-inch wafers. inch wafers, and can be used for plasma CVD The system is designed for 4/5/6 and 8-inch wafers and forms silicon oxide and silicon nitride films on wafers by the plasma...
Tokyo, Japan2020 TAIYO NIPPON SANSO BMC-301
- Manufacturer: TAIYO NIPPON SANSO
Manufacturing process: film deposition | Inch: 3
Tokyo, JapanWATKINS JOHNSON WJ-1000T
- Manufacturer: Watkins-Johnson
Manufacturing process: film deposition | Inch: 6,8
Tokyo, Japan- Tokyo, Japan
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