Surface Treatment / Cleaning » Tokyo Electron - TEL » Trias

Tokyo Electron - TEL Trias Specifications

Specifications

Process typeWet surface cleaning, spray/puddle, single-wafer
Wafer size compatibility200 mm, 300 mm
Typical throughput10-60
Automation levelFull automated cassette-to-cassette handling
The above specifications are based on the 2005 model year.

Tokyo Electron - TEL Trias description

The Tokyo Electron TEL Trias is a high-precision semiconductor surface treatment and cleaning system designed for reliable, repeatable wafer-level contamination control. Engineered for fabs and R&D, the TEL Trias combines automated handling with flexible wet-cleaning chemistries and process recipes to deliver consistent particle and film removal while supporting tight throughput and uptime requirements.

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