Tokyo Electron - TEL ACT-12 Specifications

Specifications

Wafer size200 mm
Process stepsCoating, Soft bake, Post-exposure bake, Development
Typical throughput80-200
Alignment capabilityManual/automatic process alignment
The above specifications are based on the 2000 model year.

Tokyo Electron - TEL ACT-12 description

The Tokyo Electron TEL ACT-12 is a compact photolithography track designed for resist coat and develop processes in semiconductor manufacturing. Engineered for reliable, repeatable film processing and high cleanliness, the ACT-12 streamlines coating, baking and development steps to support stable production runs and consistent process control.

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