Lam Research - Novellus Vector Specifications

Specifications

Process typePECVD, HDP‑CVD
Wafer size200 mm, 300 mm
Throughput40-120
Processing temperatureUp to 400 celsius
The above specifications are based on the 2001 model year.

Lam Research - Novellus Vector description

The Lam Research Novellus Vector is a high-throughput deposition platform designed for advanced semiconductor manufacturing. Built for uniform dielectric and gap-fill films, the Vector family delivers stable process control, repeatable film quality and throughput suited to production fabs. Its modular design supports a wide range of materials and recipes, making it ideal for applications from interlayer dielectrics to advanced packaging.

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