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Used applicators

Cassette type Batch plasma PR removal machine
- new
- Manufacturer: Minder Hightech
Application: DESCUM Wafer cleaning Removing residual glue after wet process Surface residue removal Remove residual glue after exposure and development
Guangzhou, China
ICP lab type PR removal machine
- new
- Manufacturer: Minder Hightech
Application ASHING Polymer removal DESCUM Dry removal of hard mask layer Photoresistance removal after female ion implantation Removal of optical resistance between media Photoresistance removal in BAW/SAW proces...
Guangzhou, China
Point-of-Use 3300
- new
Provides uniform and repeatable temperature control The model POU3300 Point-of-Use Thermoelectric Temperature Control System provides uniform and repeatable temperature control for plasma etch applications. The P...
Singapore
Ulvac
- new
- Manufacturer: Ulvac
Batch type equipment of chemical dry cleaning for remoral of native oxide in Narrow and Deep-contact patterns of advanced semiconductor. Damage-free (remote plasma and low-temperature process) High throughput and...
Munich, Germany
Ulvac
- new
- Manufacturer: Ulvac
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source. ICP type etching chamber, CCP or Ashing chamber is also selectable as 2nd chamber. Low process pressure, high den...
Munich, Germany
Ulvac
- new
- Manufacturer: Ulvac
Dry etching system for high volume production with good cost performance and wide selection of tool configuration. GaN Recess with selectivity to AlGaN >350 precise etch stop using laser interferometry EPD low da...
Munich, Germany
Ultrafine fiber dust-free roller cloth industrial grade wiping cloth mobile phone lens screen dust removal cloth anti-static cleaning cloth
- used
Product name : dust-free scroll cloth product width : 15MM*50 Product material : polyester + nylon composite ultrafine fiber sealing method : ultrasonic sealing Product performance : high efficiency, wide applica...
Guangdong, China
Ulvac
- new
- Manufacturer: Ulvac
NE550H is a multipurpose high-density plasma etching system, specifically for R&D test facilities such as universities and government agencies. Equipped with low-pressure, low-electron-temperature and high-densit...
Munich, Germany