Suss MA8/BA8 Mask Aligner
- Manufacturer: SÜSS MicroTec
- Model: MA8/BA8
200mm wafers, Backside Alignment (BSA), 2004 Vintage!
Yongin-si, South Korea
Canon Canon No210
- Manufacturer: Canon
Year designation: Specification: DR mask for MPA500, MPA600 Mask size for 4-inch: with 5-inch square standard glass wafers
$7,673 USDTokyo, Japan
$19,182 USDTokyo, Japan
Tokyo, Japan
$19,182 USDTokyo, Japan
Canon Canon PLA-501S
- Manufacturer: Canon
- Model: PLA501
Year: Spec: Refurbished and delivered, size and other details to be discussed.
$19,182 USDTokyo, Japan
$19,182 USDTokyo, Japan
$19,182 USDTokyo, Japan- Trusted Seller
Karl Suss MA 200 CC
- Manufacturer: SÜSS MicroTec
- Model: MA200
(refurbished by expert) TSA, Cassette to Cassette, Chuck 8”, Mask Holder for 8” Wafer, software conversation from DOS to Windows 7 Mask Aligner
Europe 
2011 Mask Aligner SUSS MicroTec MA200E
- Manufacturer: SÜSS MicroTec
- Model: MA200e
- Alignment System MA200E TSA - Chuck 8" _Mask Holder for 8" Wafer -PC -Aut. Adjustment ( Cognex Patmex ) - Lamphouse unit LH 1500 - Suss DVM 8 dual video Microscope ( 2CCD – Cameras /set of rotating Objecti...
Wu Xi Shi, China
2010 MASK ALIGNER Süss MicroTec MA200CC Lithography
- Manufacturer: Süss MicroTec
Features: Capable of wafers up to 8"/200mm Capable of working with wafer masks up to 9" x 9" Automatic mask aligner Configured for top side alignment Ergonomic Cassette plateforms 1000 watt lamp house Lamp...
Wu Xi Shi, China- Trusted Seller
1992 KARL SUSS ALIGNER MA150 MA1 TYPE 11600004
- Manufacturer: SÜSS MicroTec
- Model: MA150
Italy 
2010 MASK ALIGNER Süss MicroTec MA6/BA6 Lithography
- Manufacturer: Süss MicroTec
SUSS MA 6 / BA 6 Mask Aligner - Topside (TSA) Alignment - Backside (BSA) Alignment - Suss DVM6 Microscope - UV400 splitfield Optics (for 365nm and 405nm exposure) CIC 500 Power Supply Capable of Hard, Soft, V...
Wu Xi Shi, China
2013 MASK ALIGNER Süss MicroTec MA8/BA8 GEN3 Lithography
- Manufacturer: Süss MicroTec
The Süss MicroTec MA8 BA8 is a standard UV lithography tool for exposing wafers through the mask. Exposure can be carried out in proximity mode or in contact mode. The MA8 is equipped with top side optical micros...
Wu Xi Shi, China- Tokyo, Japan
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