Semiconductors » Deposition Equipment (CVD, PVD)

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Used temperature control module

  • Trusted Seller
    2011 APPLIED MATERIALS Centura TPCC

    2011 APPLIED MATERIALS Centura TPCC EPN

    • Manufacturer: Amat
    • Model: Centura

    - Serial Number 21693; Manufactured in 2011 - Electro Polished Nickel Frame & Modules - 2ea ENP Centura Loadlocks for 200mm Wafers - Wafer Transfer Chamber with HP Robot - High Temperature Quartz End Effector - O...

    United States
  • Trusted Seller
    2011 AMAT Centura TPCC EPN

    2011 AMAT Centura TPCC EPN

    • Manufacturer: Amat
    • Model: Centura

    Electro Polished Nickel Frame & Modules 2ea ENP Centura Loadlocks for 200mm Wafers Wafer Transfer Chamber with HP Robot High Temperature Quartz End Effector On the Fly Wafer Centering 2ea TanOx Chambers - Po...

    United States
  • Trusted Seller
    2016 Ulvac SIV 500 ITO

    2016 Ulvac SIV 500 ITO Sputter System

    • Manufacturer: Ulvac

    • 3-station process module (P1, P2, P3) • 5 kW pulsed DC power supply • P3 dedicated to ITO or other TCF • P3 has O₂ MFC & 13.56 MHz power supply/match to maintain ITO stoichiometry • L/L has roughing pump an...

    United States
  • Trusted Seller
    2014 Ulvac SIV 200 ITO

    2014 Ulvac SIV 200 ITO Sputter System

    • Manufacturer: Ulvac

    • 3-station process module (P1, P2, P3) • 5 kW pulsed DC power supply • P3 dedicated to ITO or other TCF • P3 has O₂ MFC & 13.56 MHz power supply/match to maintain ITO stoichiometry • L/L has roughing pump an...

    United States
  • Trusted Seller
    1996 AMAT Centura HDP→5300Omega

    1996 AMAT Centura HDP→5300Omega

    • Manufacturer: Amat
    • Model: Centura

    As is, where is 2ch:SiO2 D/E CH-A/B Process Contact window dry etching Wafer Size 8” Wafer Shape Notch Wafer Cassette 8" Plastic Miraial SMIF Interface NO Equipment composition 1.Equipment body 2.Primary ...

    Asia
  • CVD Tube Furnace

    CVD Tube Furnace

      CVD split type tube furnace Three gas channels with MFC High purity quartz tube Products Description CVD tube furnace is composed of a tubular heating furnace, MFC gas system and vacuum system. The heating furnac...

      Henan, China
    • PECVD Plasma enhanced chemical vapor

      PECVD Plasma enhanced chemical vapor deposition equipment

        PECVD Plasma enhanced chemical vapor deposition equipment Product introduction ◆ Fully automatic control of process time, temperature, gas flow, valve action and reaction chamber pressure is realized by industria...

        Guangzhou, China

      Overview

      CVD (Chemical Vapor Deposition) and PVD (Physical Vapor Deposition) are advanced coating technologies used to apply thin films or coatings to various substrates. CVD involves chemical reactions at the surface of a heated substrate, while PVD involves physical vaporization of a material which then condenses on the substrate. These processes are widely used in industries such as electronics, aerospace, and automotive for enhancing material properties like hardness, wear resistance, and corrosion protection.

      FAQ

      What should I consider when buying a CVD/PVD machine?

      Consider the machine's capacity, compatibility with desired coating materials, and the specific application requirements. Also, check for the machine's condition, age, and maintenance history.

      How do I ensure the CVD/PVD machine is shipped safely to my location?

      Utilize a specialized transport service experienced in handling delicate and high-value industrial equipment. Ensure the machine is properly packaged and secured to prevent any damage during transit.

      What is the maintenance schedule for a CVD/PVD machine?

      Regular maintenance includes cleaning the chamber, checking and replacing filters, inspecting seals, and calibrating the system. Follow the manufacturer’s guidelines for detailed maintenance intervals to ensure optimal performance.