2007 KARL SUSS MA150e
- Manufacturer: SÜSS MicroTec
- Model: MA150e
Manufacturing process: photolithography | Inch: 6
Tokyo, Japan- Tokyo, Japan
- Tokyo, Japan
- Tokyo, Japan
- Tokyo, Japan
1995 CANON MPA600SUPER
- Manufacturer: Canon
- Model: MPA600
Manufacturing process: photolithography | Inch: 6
Tokyo, Japan- Tokyo, Japan
Mask Aligner
MOS-2A Mask Aligner Mask Size: a. 100 x 100 x 2 ~ 3 mm b. 75 x 75 x 2 ~ 3 mm c. 65 x 65 x 2 ~ 3 mm Substrate Size: 35 ~ 75 mm OD Exposure Resolution: 2 µm Mask and Substrate Move Range: X,Y≥±2.5mm; q (Rotating) ≥...
Singapore