Ion Etching System
Substrate：CarbideCoating type：AlCrN(2-3μm) Series: IE series | Size: W 2,300mm | Weight: D 1,400mm | Gas: H 2,350mm | Ion guns: Approx. 1,600kg | Max elec. consumption: Ar, O2 | Carbon: 4, 6, 8 sources | Nitridin...
Kobe, Japan
Diamond Coating System
System/method: Hot Filament CVD | Device dimensions(mm): L2,480×W1,320×H2,240 | Chamberdimensions (mm): L620×W600×H500 | Can be installedsize (mm): Tool: φ0.5 - φ20 L200Flat plate: φ250 t30 | Substrate material:...
Kobe, Japan- Kobe, Japan
- Kobe, Japan
Batch type vapor deposition + plasma polymerization system
Substrate size(including jigs, etc.): φ540×1,500mm 2 axes
Kobe, Japan- Kobe, Japan
- Kobe, Japan
Roll to Roll Drying Equipment
Electrode information: Diameter - Max. 700 mm / Weight - Max. 450kg | Temperature: Temperature in empty chamber - 40℃ ~ 180℃ 土 3℃ | Production capacity: 3,600m/hr | Tension: 20～200N | Default configuration: Un-W...
Kobe, Japan- Kobe, Japan
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