Used Mask Aligners

MDXN-25X High precision single side lithography machine

MDXN-25X High precision single sided lithography machine Purpose and characteristics This equipment is a precision lithography machine developed by our company specifically for the use characteristics of lithogra...

MDXN-31D4 High precision double-sided lithography machine

MDXN-31D4 High precision double-sided lithography machine Purpose and characteristics This equipment is mainly used for the development and production of small and medium-sized integrated circuits, semiconductor ...

SUSS MA150CC

• Manufacturer: SÜSS MicroTec
• Model: MA150

SUSS MA150CC MASK ALIGNER AS-IS MANUAL TOPSIDE ALIGNER WAFER SIZE: 150MM AVAILABLE IN WAREHOUSE

Spin coater without temperature

---Spin Coater The Spin Coater is a device that drips all kinds of glue on a high-speed rotating substrate and uses centrifugal force to uniformly coat the glue on the substrate. The thickness of the film depends...

2007 KARL SUSS MA150e

• Manufacturer: SÜSS MicroTec
• Model: MA150e

Manufacturing process: photolithography | Inch: 6

CANON PLA501FA

• Manufacturer: Canon
• Model: PLA501

Manufacturing process: photolithography | Inch: 5

CANON PLA600F

• Manufacturer: Canon
• Model: PLA600

Manufacturing process: photolithography | Inch: 6

CANON PLA501F

• Manufacturer: Canon
• Model: PLA501

Manufacturing process: photolithography

CANON MPA600FA

• Manufacturer: Canon
• Model: MPA600

Manufacturing process: photolithography | Inch: 4

1995 CANON MPA600SUPER

• Manufacturer: Canon
• Model: MPA600

Manufacturing process: photolithography | Inch: 6

CANON MPA600FA

• Manufacturer: Canon
• Model: MPA600

Manufacturing process: photolithography | Inch: 6

Mask Aligner

MOS-2A Mask Aligner Mask Size: a. 100 x 100 x 2 ~ 3 mm b. 75 x 75 x 2 ~ 3 mm c. 65 x 65 x 2 ~ 3 mm Substrate Size: 35 ~ 75 mm OD Exposure Resolution: 2 µm Mask and Substrate Move Range: X,Y≥±2.5mm; q (Rotating) ≥...